Masato Onishi

Title: Masato Onishi: Innovator in Semiconductor Technology

Introduction

Masato Onishi is a notable inventor based in Fukushima, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on innovative methods and apparatuses that enhance the evaluation and handling of semiconductor wafers.

Latest Patents

Onishi's latest patents include a "Holding Gripper and Holding Method for Semiconductor Wafer" and a "Shape Measuring Apparatus." The first invention provides a strip-like holding gripper designed to securely hold a semiconductor wafer during shape measurement. This gripper features a rounded shape with a groove that contacts the wafer's edge, ensuring stability even when the gripper is inclined. The second patent outlines a method for evaluating the shape of a semiconductor wafer, which involves measuring shape data, calculating a differential profile, and analyzing the results to assess the wafer's surface characteristics. This innovative approach allows for a more accurate evaluation of the wafer's shape quality, particularly in relation to strict design specifications.

Career Highlights

Throughout his career, Masato Onishi has worked with prominent companies in the semiconductor industry, including Shin-Etsu Handotai Co., Ltd. and Japan Ade Ltd. His experience in these organizations has contributed to his expertise and innovative capabilities in semiconductor technology.

Collaborations

Onishi has collaborated with notable colleagues such as Koichi Kanaya and Masakazu Sato. These partnerships have likely fostered a creative environment that encourages the development of groundbreaking technologies in the semiconductor field.

Conclusion

Masato Onishi's contributions to semiconductor technology through his patents and career experiences highlight his role as an influential inventor. His innovative approaches to wafer handling and evaluation continue to impact the industry positively.