Hyogo, Japan

Masataka Okabe

USPTO Granted Patents = 3 

Average Co-Inventor Count = 3.0

ph-index = 3

Forward Citations = 18(Granted Patents)


Location History:

  • Itami, JP (2003)
  • Hyogo, JP (2003 - 2004)

Company Filing History:


Years Active: 2003-2004

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3 patents (USPTO):Explore Patents

Title: Masataka Okabe: Innovator in Process Control Technology

Introduction

Masataka Okabe is a notable inventor based in Hyogo, Japan. He has made significant contributions to the field of process control technology, holding a total of 3 patents. His work focuses on improving the efficiency and effectiveness of processing devices, particularly in the semiconductor industry.

Latest Patents

One of Okabe's latest patents is a process control device and method designed to manage multiple processing devices operating in parallel. This device is particularly useful for processing workpieces in a lot, allowing for the grouping of processing devices based on their characteristics. For instance, when dealing with semiconductor devices, those with similar deviating characteristics are grouped together to perform various photolithographic steps. Another significant patent is a sampling inspection managing system, which optimizes the inspection frequency for different products during processing. This system allows for tailored inspection frequencies based on the processing number of lots, ensuring that each lot is inspected appropriately.

Career Highlights

Throughout his career, Masataka Okabe has worked with prominent companies, including Mitsubishi Electric Corporation. His experience in these organizations has allowed him to develop innovative solutions that address complex challenges in process control.

Collaborations

Okabe has collaborated with notable colleagues such as Taichi Yanaru and Hirofumi Ohtsuka. Their combined expertise has contributed to advancements in the technologies they have worked on together.

Conclusion

Masataka Okabe's contributions to process control technology highlight his innovative spirit and dedication to improving industrial processes. His patents reflect a deep understanding of the complexities involved in semiconductor manufacturing and inspection systems.

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