Masashi Norimoto

Title: Masashi Norimoto: Innovator in Semiconductor Wafer Manufacturing

Introduction

Masashi Norimoto is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor wafer manufacturing, holding 2 patents that enhance the quality and precision of silicon wafers.

Latest Patents

Norimoto's latest patents include a "Method for manufacturing single-side mirror surface wafer" and a "Method for producing a silicon wafer." The first patent describes a process where a semiconductor wafer, after being lapped, undergoes grinding to remove surface damage, thereby improving flatness. This method utilizes composite etching and mirror polishing to achieve a single-side mirror surface wafer with superior flatness compared to traditional acid or alkali etching methods. The second patent outlines an improved technique for producing silicon wafers with precise flatness and minimal surface roughness. This method involves multiple steps, including slicing, chamfering, lapping, etching, mirror polishing, and cleaning, ensuring that the front and rear surfaces can be visually distinguished.

Career Highlights

Throughout his career, Norimoto has worked with notable companies such as Sumco Corporation and Sumitomo Mitsubishi Silicon Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in semiconductor technology.

Collaborations

Norimoto has collaborated with esteemed colleagues, including Sakae Koyata and Kazushige Takaishi. Their joint efforts have further propelled innovations in the semiconductor industry.

Conclusion

Masashi Norimoto's work in semiconductor wafer manufacturing exemplifies the impact of innovative thinking in technology. His patents not only improve the manufacturing process but also enhance the quality of silicon wafers used in various applications.