Masaru Kitagawa

Title: Masaru Kitagawa: Innovator in Substrate Processing Technologies

Introduction

Masaru Kitagawa is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing, holding a total of 7 patents. His innovative approaches have advanced the technology used in various industrial applications.

Latest Patents

Kitagawa's latest patents include a "Method and apparatus for degassing processing solution for substrates." This invention provides a degassing apparatus with a temperature regulating function. The apparatus features gas permeating tubes that allow a processing solution to flow through one of two flow paths, while warm water flows through the other. A temperature regulator maintains the warm water's temperature, and a gas suction pump removes gas from the warm water. Another notable patent is the "Method and apparatus for drying a substrate having a resist film." This method involves developing a substrate with a photo-sensitive resin film, washing it with a liquid, and drying it under reduced pressure. The process may also utilize a washing liquid supersaturated with gas.

Career Highlights

Throughout his career, Kitagawa has worked with notable companies such as Dainippon Screen Manufacturing Co., Ltd. and Kyoto Pharmaceutical Industries, Ltd. His work in these organizations has allowed him to refine his expertise in substrate processing technologies.

Collaborations

Kitagawa has collaborated with esteemed colleagues, including Hiroaki Sugimoto and Nobutoshi Ogami. These partnerships have contributed to the development of innovative solutions in the field.

Conclusion

Masaru Kitagawa's contributions to substrate processing technologies through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in this critical area of technology.