Dainippon Screen Mfg. Co., Ltd.

Kyoto Pharmaceutical Industries, Ltd.

Masaru Kitagawa

Hiroaki Sugimoto

Kenji Sugimoto

Mitsuhiro Fujita

Hisao Nishizawa

Kazuhiko Kitao

Nobutoshi Ogami

Susumu Nishizawa

Masahiro Nonomura

Manabu Yabe

Satoshi Tamaki

Takafumi Ohki

Nobutoshi Ohgami

Masakazu Saita

Hirokazu Tsuda

Nobuhara Kakeya

The present invention provides a degassing apparatus having a temperature regulating function. The degassing apparatus includes a number of gas permeating tubes for enabling a processing solution to flow through one of the two flow paths partitioned by gas permeating membranes that allow permeation of a gas but prevent permeation of a liquid, while enabling warm water to flow through the other flow path. A temperature regulator regulates the temperature of the warm water fed to the gas permeating tubes, and a gas suction pump sucks the gas from the warm water.

Method and apparatus for degassing processing solution for substrates

A method of processing a substrate includes the steps of developing a substrate having a photo-sensitive resin film formed on its surface; washing the substrate by supplying washing liquid to the surface of the substrate, and rotating the substrate on a perpendicular axis in a horizontal plane and thereby drying the surface of the substrate, and atmosphere in which the substrate is placed is adjusted to be at a pressure lower than the atmospheric pressure in the step of drying the surface of the substrate. Instead of or in addition to this, washing liquid in which prescribed gas is dissolved may be used in the step of washing the substrate. In this case, in the step of drying the surface of the substrate, washing liquid supplied to the surface of the substrate is preferably supersaturated with gas. A substrate processing apparatus including a controller for implementing such a method is also disclosed.

Method and apparatus for drying a substrate having a resist film with a

A substrate holder for use in a substrate spin treating apparatus carries out a desired treatment of a substrate by supplying treating liquid to a surface of the substrate while spinning the substrate. The substrate holder includes a turntable rotatable in a horizontal plane and a motor for rotating the turntable. Support pins are arranged on the turntable for supporting the substrate in a horizontal posture above and spaced from a surface of the turntable. A vertically movable disk of a size at least corresponding to the substrate is disposed between the turntable and the substrate being supported by the support pins. A raising and lowering device is provided for lowering the vertically movable disk to a lower position adjacent the turntable when the turntable is at rest, and raising the vertically movable disk to an upper position adjacent a substrate on the support pins when the turntable is in rotation to effect the treatment.

Substrate holder for a substrate spin treating apparatus

A dispensing apparatus for delivering a silica coating solution in a fixed quantity from a liquid container to a surface of a substrate to form a silica film thereon. The liquid container storing the silica coating solution is connected to a diaphragm pump through a suction pipe. The diaphragm pump is connected to a nozzle through a delivery pipe. The coating solution in the liquid container is supplied to the nozzle by sucking and delivering action of the diaphragm pump. The coating solution is discharged from the nozzle to a surface of a substrate supported by a spin chuck of a spin coating apparatus.

Apparatus for delivering a silica film forming solution

Cromoglycic acid derivatives, method of production thereof and

A surface treatment apparatus is composed of a supporting die for holding a substrate thereon to heat or cool the substrate; a cover capable of advancing close to the supporting die or into point-to-point contact with the supporting die to define a treatment space over the entire upper surface of the substrate on the supporting die, said cover defining a hole for the introduction of a surface treatment agent into the treatment space; and an evacuation chamber provided on the peripheral side wall of the supporting die, whereby the surface treatment agent is allowed to flow out from the treatment space into the evacuation chamber. No substantial conduction of heat takes place from the supporting die by way of the cover. The thermal distribution of the supporting die is thus kept extremely uniform, whereby each surface treatment can be conducted uniformly. Furthermore, owing to the provision of the evacuation chamber around the supporting die, the vaporized surface treatment agent is not allowed to escape into the room. The apparatus is effective in applying an adhesion-enhancing agent to a substrate so that the adhesion of a photoresist to the substrate is facilitated.

Surface treatment apparatus

In a method of surface treatment irradiating a part of a plate to be treated with light flux, detecting a quantity of transmitted light or reflected light on the plate corresponding to the light flux, detecting an end point of surface treatment based on the variation in the detected signal level the combination with the method of a step of detecting whether the detected signal level exceeds a predetermined target level within a predetermined period of time, a step of repeatedly setting up a new target level so long as the detected level is found exceeding the predetermined target level, and a step of determining the end point of the surface treatment at the moment when the detected signal level is found not exceeding the new target level.

Method of surface treatment

Growing community of inventors

Kyoto, Japan

Masaru Kitagawa