Kyoto, Japan

Masao Naito


Average Co-Inventor Count = 2.2

ph-index = 5

Forward Citations = 47(Granted Patents)


Company Filing History:


Years Active: 1995-2017

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9 patents (USPTO):Explore Patents

Title: Inventor Masao Naito: Innovating Ion Beam Technologies

Introduction

Masao Naito is a distinguished inventor based in Kyoto, Japan, recognized for his significant contributions to the field of ion beam technology. With a total of nine patents to his name, Naito's work has had a profound impact on semiconductor manufacturing processes.

Latest Patents

Among his latest innovations, Naito has developed an "Ion Beam Scanner for an Ion Implanter." This technology features a magnetic system designed to uniformly scan an ion beam across a semiconductor wafer. The system incorporates both alternating current (ac) and direct current (dc) coil windings that are orthogonal to each other, allowing for efficient ion beam bending and scanning. The current density in these coil windings is uniformly distributed, which enhances the uniformity of the beam spot on the wafer. Additionally, he has designed an "Ion Implantation Apparatus" that integrates shaping masks to refine the edges of a ribbon-like ion beam. This apparatus includes a profiler for measuring current distribution in the beam and a variable electron beam supply unit, ensuring optimized ion beam shaping.

Career Highlights

Throughout his career, Masao Naito has worked with notable companies, including Nissin Ion Equipment Co., Ltd. and Nissin Electric Co., Ltd. His roles in these organizations have allowed him to pioneer advancements in ion implantation technologies, further establishing his reputation as an innovator in the field.

Collaborations

Naito has collaborated with esteemed colleagues, such as Hilton Frank Glavish and Nobuo Nagai. Together, they have contributed to the evolution of semiconductor technologies, enhancing the capabilities of ion implantation equipment and improving manufacturing efficiency.

Conclusion

Masao Naito's contributions to ion beam technology have made a significant impact on the semiconductor industry. With his continued innovation and collaboration with industry leaders, he remains a pivotal figure in advancing the technology that plays a critical role in modern electronics.

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