The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2006
Filed:
May. 14, 2004
Syuichi Maeno, Kyoto, JP;
Masao Naito, Kyoto, JP;
Yasunori Ando, Kyoto, JP;
Hilton F. Glavish, Incline Village, NV (US);
Syuichi Maeno, Kyoto, JP;
Masao Naito, Kyoto, JP;
Yasunori Ando, Kyoto, JP;
Hilton F. Glavish, Incline Village, NV (US);
Nissin Ion Equipment Co., Ltd., Kyoto, JP;
Abstract
The ion implanting apparatus according to this invention includes: an ion source for producing the ion beamincluding desired ion species and being shaped in a sheet with a width longer than a narrow width of a substratea mass separating magnetfor selectively deriving the desired ion species by bending the ion beam in a direction perpendicular to a sheet face thereof, a separating slitfor selectively making the desired ion species pass through by cooperating with the mass separating magnetand a substrate drive devicefor reciprocatedly driving the substratein a direction substantially perpendicular to the sheet faceof the ion beamwithin an irradiating area of the ion beamwhich has passed through a separating slit