Syuichi Maeno

Title: Innovations by Syuichi Maeno in Ion Implantation Technology

Introduction

Syuichi Maeno, an inventor based in Kyoto, Japan, has made significant contributions to the field of ion implantation technology. With a notable patent to his name, Maeno has been instrumental in advancing methods used in the processing of semiconductor materials.

Latest Patents

Maeno holds a patent for an ion implanting apparatus that showcases his innovative approach to ion beam technology. This apparatus includes an ion source capable of producing an ion beam featuring desired ion species, shaped in a width longer than the substrate. The design incorporates a mass separating magnet that selectively derives desired ion species by bending the ion beam perpendicularly to the sheet face. Furthermore, the apparatus utilizes a separating slit aligned with the mass separating magnet to allow selective passage of the desired ion species. Additionally, it features a substrate drive device that reciprocates the substrate in a perpendicular direction to the ion beam within the irradiation area.

Career Highlights

Currently, Syuichi Maeno is employed at Nissin Ion Equipment Co., Ltd., where he applies his expertise in ion implantation apparatus design. His inventive spirit and his patent underline the importance of innovation in enhancing semiconductor manufacturing processes.

Collaborations

Maeno has worked alongside notable colleagues, including Masao Naito and Yasunori Ando, who have contributed to his research and development endeavors. Their collaborative efforts reflect a commitment to advancing technology within the field of ion implantation.

Conclusion

Syuichi Maeno's work stands as a testament to the continuous evolution of innovations in semiconductor technology. His patent on the ion implanting apparatus not only highlights his individual contributions but also emphasizes the importance of collaboration in technological advancement.