Nissin Ion Equipment Co., Ltd.

Syuichi Maeno

Yasunori Ando

Hilton Frank Glavish

Masao Naito

The ion implanting apparatus according to this invention includes: an ion source for producing the ion beamincluding desired ion species and being shaped in a sheet with a width longer than a narrow width of a substratea mass separating magnetfor selectively deriving the desired ion species by bending the ion beam in a direction perpendicular to a sheet face thereof, a separating slitfor selectively making the desired ion species pass through by cooperating with the mass separating magnetand a substrate drive devicefor reciprocatedly driving the substratein a direction substantially perpendicular to the sheet faceof the ion beamwithin an irradiating area of the ion beamwhich has passed through a separating slit

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Kyoto, Japan

Syuichi Maeno