Chiba, Japan

Masanso Munekane

This inventor holds 1 USPTO granted patent. Top assignee: Sii Nanotechnology Inc.. Active years: 2008.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: Masanso Munekane: Innovator in Semiconductor Technology

Introduction

Masanso Munekane is a notable inventor based in Chiba, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent work. His expertise and dedication to advancing technology have positioned him as a key figure in his industry.

Latest Patents

Masanso Munekane holds a patent for a "Sample support prepared by semiconductor silicon process technique." This invention involves a sample support that utilizes a silicon substrate as a raw material. The design features a thickness structure of 10 micrometers or less, achieved through a semiconductor silicon process technique. The sample support is uniquely adhered to a partially-cut mesh, ensuring that the sample portion remains unadhered. Additionally, multiple sample mounting portions are arranged on the same substrate, enhancing its functionality.

Career Highlights

Masanso Munekane is currently employed at Sii Nanotechnology Inc., where he continues to develop innovative solutions in semiconductor technology. His work has garnered attention for its practical applications and potential to improve various technological processes.

Collaborations

Masanso has collaborated with Kouji Iwasaki, a fellow innovator in the field. Their partnership has contributed to advancements in semiconductor technologies and has fostered a creative environment for innovation.

Conclusion

Masanso Munekane's contributions to semiconductor technology through his patent work exemplify his commitment to innovation. His ongoing efforts at Sii Nanotechnology Inc. and collaborations with other professionals highlight the importance of teamwork in driving technological advancements.

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