Masanori Miyauchi

Title: Masanori Miyauchi: Innovator in Semiconductor Technology

Introduction

Masanori Miyauchi is a prominent inventor based in Ome, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on improving the efficiency and performance of semiconductor integrated circuit devices.

Latest Patents

Miyauchi's latest patents include a semiconductor integrated circuit device and a method of manufacturing the same. In this innovative process, an interconnect trench and a contact hole are formed in an interlayer insulating film over a first-level interconnect on a semiconductor substrate. A barrier film is created inside the trench and contact hole, with its thickness increasing from the center of the bottom of the hole toward the sidewalls. A copper film is then deposited over the barrier film, followed by the formation of a second-level interconnect and a connector portion (plug) through polishing by CMP. This design ensures that the shortest pathway of electrical current does not coincide with the thin barrier film portion, allowing for better current dispersion and reducing electron concentration.

Career Highlights

Masanori Miyauchi has worked with notable companies in the semiconductor industry, including Renesas Technology Corporation and Renesas Electronics Corporation. His experience in these organizations has contributed to his expertise in semiconductor manufacturing and design.

Collaborations

Miyauchi has collaborated with several professionals in his field, including Kensuke Ishikawa and Tatsuyuki Saito. These partnerships have likely enhanced his innovative capabilities and contributed to his successful patent portfolio.

Conclusion

Masanori Miyauchi is a key figure in the semiconductor industry, with a focus on enhancing integrated circuit devices. His patents reflect his commitment to innovation and improvement in semiconductor technology.