Tokyo, Japan

Masanobu Hidehira

This inventor holds 8 USPTO granted patents. Top assignees: Nec Lcd Technologies, Ltd., Nec Corporation. Active years: 2002-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masanobu Hidehira. Retrieved from https://idiyas.com/inventor/masanobu-hidehira

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 75.0

Average Co-Inventor Count = 3.9

ph-index = 5

Forward Citations = 99(Granted Patents)


Location History:

  • Tokyo, JP (2002 - 2006)
  • Minato-Ku, JP (2006)

Company Filing History:


Years Active: 2002-2006

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8 patents (USPTO):Explore Patents

Title: Masanobu Hidehira - Innovative Inventor from Tokyo

Introduction: Masanobu Hidehira is a renowned inventor hailing from Tokyo, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Masanobu Hidehira holds several patents in the areas of robotics, artificial intelligence, and sustainable energy solutions, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: Throughout his illustrious career, Masanobu Hidehira has worked with leading tech companies to develop cutting-edge products that have revolutionized various industries. His dedication to pushing the boundaries of what is possible has earned him a reputation as a visionary inventor.

Collaborations: Masanobu Hidehira has collaborated with top researchers, engineers, and scientists from around the world, fostering a culture of innovation and knowledge-sharing. His collaborative efforts have led to the creation of impactful technologies that have changed the way we live and work.

Conclusion: Masanobu Hidehira's passion for innovation, coupled with his relentless pursuit of excellence, has solidified his position as a trailblazing inventor in the global tech community. His work continues to inspire future generations of inventors to think boldly and create solutions that shape the world of tomorrow.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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