This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Hitachi Chemical Company, Ltd.. Active years: 2008-2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2008-2015
Title: Masanobu Habiro: Innovator in Polishing Solutions
Introduction
Masanobu Habiro is a notable inventor based in Hitachi, Japan. He has made significant contributions to the field of polishing solutions, particularly in the semiconductor industry. With a total of 3 patents to his name, Habiro's work has had a profound impact on the efficiency and reliability of semiconductor manufacturing processes.
Latest Patents
One of Habiro's latest patents is a polishing solution for Chemical Mechanical Planarization (CMP). This innovative solution comprises abrasive grains, an additive, and water. The additive includes an organic compound that meets specific conditions, enhancing the polishing process. The associated polishing method involves polishing a substrate with a silicon oxide film using a polishing pad while supplying the CMP solution, ensuring optimal results.
Another significant patent is for a polishing slurry designed for metal surfaces. This slurry includes an oxidizer, a metal oxide dissolving agent, a metal inhibitor, and water. The unique formulation allows for a high polishing speed while minimizing etching and corrosion, thus ensuring the formation of reliable metal-film-buried patterns during semiconductor wiring processes.
Career Highlights
Masanobu Habiro is currently employed at Hitachi Chemical Company, Ltd., where he continues to develop innovative solutions in the field of polishing technology. His expertise and dedication to research have positioned him as a key figure in advancing semiconductor manufacturing techniques.
Collaborations
Throughout his career, Habiro has collaborated with talented individuals such as Masaya Nishiyama and Yasuhito Iwatsuki. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Masanobu Habiro's contributions to polishing solutions have significantly advanced the semiconductor industry. His innovative patents and collaborative efforts continue to shape the future of semiconductor manufacturing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile