Location History:
- Gunma, JP (2000 - 2002)
- Osaka, JP (1999 - 2009)
Company Filing History:
Years Active: 1999-2009
Title: **Masanao Kitagawa: Innovator in Semiconductor Technology**
Introduction
Masanao Kitagawa is a noted inventor based in Osaka, Japan, recognized for his contributions to the field of semiconductor technology. With a total of six patents to his name, Kitagawa has made a significant impact in the world of electronics and power management.
Latest Patents
One of Kitagawa's latest patents is for a novel semiconductor device and a method for fabricating the same, specifically pertaining to a power MOSFET. This invention includes a semiconductor substrate of a first conduction type, alongside a drain layer formed on the substrate's surface. Key components of the invention also involve a gate insulating film, gate electrode, insulating film, and side wall insulator, meticulously arranged to improve device performance. The structure is defined by a recess formed on the drain layer and a channel layer of a second conduction type, which collectively work to enhance the efficiency of power management in electronic devices.
Career Highlights
Currently, Masanao Kitagawa is associated with Sanyo Electric Co., Ltd., where he continues to innovate within the semiconductor landscape. His extensive knowledge and expertise in the field have allowed him to secure multiple patents, reflecting his commitment to advancing technology.
Collaborations
Throughout his career, Kitagawa has had the opportunity to collaborate with distinguished colleagues, including Hirotoshi Kubo and Eiichiroh Kuwako. These collaborations have further enriched his research and contributed to the innovation of new technologies in the semiconductor domain.
Conclusion
Masanao Kitagawa stands as a prominent inventor whose contributions to semiconductor technology have paved the way for advancements in electronic devices. With an impressive portfolio of patents and a commitment to innovation, his work continues to benefit the industry and influence future developments.