Company Filing History:
Years Active: 2016-2017
Title: Biography of Inventor Masaki Satake
Introduction
Masaki Satake is an accomplished inventor based in San Jose, California. He has made significant contributions to the field of photolithography and multilayer stack fabrication. With a total of two patents to his name, Satake's work has advanced the technology used in the semiconductor industry.
Latest Patents
His latest patents include a "Film-growth model using level sets" and a "Technique for repairing an EUV photo-mask." The film-growth model provides a method for determining surface profiles in a multilayer stack during fabrication, utilizing a model based on a generalized Eikonal equation. This innovation allows for the simulation of deposition or growth of the multilayer stack, which is crucial for applications such as extreme ultra-violet photolithography. The technique for repairing an EUV photo-mask involves calculating modifications to a reflective photo-mask based on defects, ensuring high precision in photolithographic processes.
Career Highlights
Masaki Satake is currently employed at KLA Corporation, a leading company in the semiconductor industry. His expertise in photolithography and multilayer stack technology has positioned him as a key player in the development of advanced manufacturing techniques.
Collaborations
Throughout his career, Satake has collaborated with notable colleagues, including Daniel Ping Peng and Changqing Hu. These collaborations have fostered innovation and contributed to the success of various projects within the