San Jose, CA, United States of America

Masaki Satake

This inventor holds 2 USPTO granted patents. Top assignee: Kla Tencor Corporation. Active years: 2016-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masaki Satake. Retrieved from https://idiyas.com/inventor/masaki-satake-jhd1bc5i

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.4

ph-index = 1


Company Filing History:


Years Active: 2016-2017

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Biography of Inventor Masaki Satake

Introduction

Masaki Satake is an accomplished inventor based in San Jose, California. He has made significant contributions to the field of photolithography and multilayer stack fabrication. With a total of two patents to his name, Satake's work has advanced the technology used in the semiconductor industry.

Latest Patents

His latest patents include a "Film-growth model using level sets" and a "Technique for repairing an EUV photo-mask." The film-growth model provides a method for determining surface profiles in a multilayer stack during fabrication, utilizing a model based on a generalized Eikonal equation. This innovation allows for the simulation of deposition or growth of the multilayer stack, which is crucial for applications such as extreme ultra-violet photolithography. The technique for repairing an EUV photo-mask involves calculating modifications to a reflective photo-mask based on defects, ensuring high precision in photolithographic processes.

Career Highlights

Masaki Satake is currently employed at KLA Corporation, a leading company in the semiconductor industry. His expertise in photolithography and multilayer stack technology has positioned him as a key player in the development of advanced manufacturing techniques.

Collaborations

Throughout his career, Satake has collaborated with notable colleagues, including Daniel Ping Peng and Changqing Hu. These collaborations have fostered innovation and contributed to the success of various projects within the

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…