The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2016
Filed:
Mar. 14, 2013
Dino Technology Acquisition Llc, Milpitas, CA (US);
Masaki Satake, San Jose, CA (US);
Linyong Pang, Los Gatos, CA (US);
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
During a calculation technique, a modification to a reflective photo-mask is calculated. In particular, using information specifying a defect associated with a recessed area on a top surface of the reflective photo-mask, the modification to the reflective photo-mask is calculated. For example, the calculation may involve an inverse optical calculation in which a difference between a pattern associated with the reflective photo-mask at an image plane in a photo-lithographic process and a reference pattern at the image plane in the photo-lithographic process is used to calculate the modification at an object plane in the photo-lithographic process. Note that the modification includes a negative feature in which one or more pairs of layers in a multilayer stack in the reflective photo-mask are removed using a subtractive fabrication process. Moreover, the modification is proximate to the recessed area.