Nirasaki, Japan

Masahiro Mukoyama


Average Co-Inventor Count = 3.0

ph-index = 3

Forward Citations = 24(Granted Patents)


Company Filing History:


Years Active: 2006-2009

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4 patents (USPTO):Explore Patents

Title: Masahiro Mukoyama: A Pioneer in Substrate Processing Technologies

Introduction: Masahiro Mukoyama, hailing from Nirasaki, Japan, is an accomplished inventor with a demonstrated track record of innovation in substrate processing technologies. With four patents to his name, Mukoyama has made significant contributions to the field, particularly in the design and functionality of cleaning apparatus used in semiconductor manufacturing.

Latest Patents: Among Mukoyama's latest innovations are the following patents:

1. **Substrate Processing Apparatus** - This invention features a substrate processing part for treating a substrate with a processing liquid, along with a processing-liquid recovery path designed to facilitate the passage of the discharged processing liquid. The innovative design incorporates foreign substance removal lines equipped with filters and cleaning mechanisms to effectively remove impurities from the processing liquid. This advancement addresses common issues such as blockage in pipes and extends the lifespan of the filters used.

2. **Liquid Processing Apparatus and Liquid Processing Method** - This cleaning processing apparatus includes a spin chuck for holding a wafer, an under plate positioned to face the wafer’s back surface, and a nozzle hole designed for the flow of chemicals. It allows the supply of a chemical liquid, pure water, and gas through opening-closing valves. Mukoyama's design ensures that pure water remaining inside the nozzle hole can be effectively sucked out by a device after processing, followed by the application of a gas to enhance the cleaning process.

Career Highlights: Mukoyama works at Tokyo Electron Limited, a leading company in semiconductor equipment and technology. His work there focuses on developing advanced cleaning solutions critical to the manufacturing processes in the semiconductor industry. Mukoyama's inventive approaches have helped streamline operations and improve product quality, substantiating his reputation as a key player in his domain.

Collaborations: Throughout his career, Mukoyama has collaborated with notable colleagues such as Takehiko Orii and Hiromitsu Nanba. These partnerships have fostered a creative environment that has inspired innovation and resulted in groundbreaking technologies within their field.

Conclusion: Masahiro Mukoyama stands out as a brilliant inventor whose patents reflect both creativity and practicality in substrate processing technology. His contributions are instrumental in enhancing the efficiency and reliability of semiconductor manufacturing processes. As the industry evolves, his work continues to pave the way for future innovations, cementing his legacy in the realm of engineering and technology.

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