The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 2009

Filed:

Apr. 28, 2006
Applicants:

Masaru Amai, Tokyo-To, JP;

Masahiro Mukoyama, Nirasaki, JP;

Takayuki Toshima, Nirasaki, JP;

Inventors:

Masaru Amai, Tokyo-To, JP;

Masahiro Mukoyama, Nirasaki, JP;

Takayuki Toshima, Nirasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

A substrate processing apparatus includes a substrate processing partfor processing a substrate by a processing liquid and a processing-liquid recovery pathallowing of a passage of the processing liquid discharged from the substrate processing part. The processing-liquid recovery pathis provided with foreign substance removal linesincluding filtersfor removing an foreign substance from the processing liquid and cleanersfor cleaning the filtersrespectively. With this constitution, it is possible to cancel the blocking of foreign substances in pipes etc. and also possible to lengthen the life span of the filters.


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