This inventor holds 2 USPTO granted patents. Top assignee: Kaneka Corporation. Active years: 2015-2019.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Kanazawa, JP (2015)
- Ishikawa, JP (2019)
Company Filing History:
Years Active: 2015-2019
Title: Masahiro Ishida: Innovator in Arc-Resistance Performance Evaluation
Introduction
Masahiro Ishida is a prominent inventor based in Ishikawa, Japan. He has made significant contributions to the field of arc-resistance performance evaluation, holding 2 patents that showcase his innovative approach to technology.
Latest Patents
Ishida's latest patents include a "Method for evaluating arc-resistance performance and arc-resistance performance evaluation device." This device features a plasma generator that produces plasma, along with a stand designed to hold a sheet-like test piece. The stand is equipped with a temperature measurement device that monitors the temperature on the back surface of the test piece during evaluation. Another notable patent is the "Arc resistance performance evaluation device, arc resistance performance evaluation system, and arc resistance performance evaluation method." This invention incorporates a high-frequency induction thermal plasma generation unit and a testing subject installing pedestal, allowing for the observation of ablated vapor generated from the testing subject.
Career Highlights
Masahiro Ishida is currently employed at Kaneka Corporation, where he continues to develop innovative solutions in his field. His work has garnered attention for its practical applications and contributions to safety and performance evaluation.
Collaborations
Ishida collaborates with notable colleagues, including Yasunori Tanaka and Hiroyasu Hagi, who contribute to his research and development efforts.
Conclusion
Masahiro Ishida's work in arc-resistance performance evaluation exemplifies the spirit of innovation and dedication to advancing technology. His patents reflect a commitment to enhancing safety and performance in various applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
