Masaaki Taniyama

Title: Masaaki Taniyama: Innovator in Plasma Processing Technology

Introduction

Masaaki Taniyama is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of plasma processing, holding two patents that showcase his innovative approach to improving etching selectivity and reducing roughness in mask patterns.

Latest Patents

Taniyama's latest patents include a plasma processing method designed to enhance the etching selectivity of materials in relation to mask materials. This method effectively reduces the roughness of the side walls of mask patterns. The process involves controlling etching parameters to ensure that the incubation time of the mask material is shorter than that of the material being etched. Another notable patent involves a plasma processing method where plasma etching is performed on a film using a mask. This method includes a deposition step that deposits a boron-containing film on the mask while radio frequency power is supplied, followed by an etching step using plasma.

Career Highlights

Masaaki Taniyama is associated with Hitachi High-Tech Corporation, where he continues to develop and refine his innovative techniques in plasma processing. His work has been instrumental in advancing the capabilities of etching technologies.

Collaborations

Taniyama has collaborated with notable colleagues, including Kenichi Kuwahara and Mamoru Yakushiji, contributing to a dynamic research environment that fosters innovation.

Conclusion

Masaaki Taniyama's contributions to plasma processing technology reflect his dedication to innovation and excellence in the field. His patents not only enhance the efficiency of etching processes but also pave the way for future advancements in material processing.