This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Siltronic Ag. Active years: 2025.
Company Filing History:
Years Active: 2025
Title: Martin Wengbauer: Innovator in Epitaxial Layer Deposition
Introduction
Martin Wengbauer is a notable inventor based in Winhoering, Germany. He has made significant contributions to the field of semiconductor technology, particularly in the method of depositing epitaxial layers on substrate wafers. His innovative approach has implications for the efficiency and quality of semiconductor manufacturing.
Latest Patents
Wengbauer holds a patent for a method that involves measuring the edge geometry of a substrate wafer. This method includes placing the wafer in a specific position within a pocket of a susceptor, heating the wafer, and passing a process gas over it. The technique assigns thickness characteristic values to edge portions based on the edge geometry, ensuring that the layer thicknesses are inversely related to the wafer thicknesses. This patent is a testament to his expertise and innovative thinking in the semiconductor industry. He has 1 patent to his name.
Career Highlights
Wengbauer is currently employed at Siltronic AG, a leading company in the production of silicon wafers. His work at Siltronic AG has allowed him to apply his innovative methods in a practical setting, contributing to advancements in semiconductor technology. His career reflects a commitment to excellence and innovation in his field.
Collaborations
Wengbauer collaborates with Thomas Stettner, a fellow professional in the industry. Their partnership exemplifies the collaborative spirit that drives innovation in technology.
Conclusion
Martin Wengbauer's contributions to the field of semiconductor technology through his innovative patent demonstrate his role as a key inventor in the industry. His work continues to influence the methods used in the deposition of epitaxial layers, showcasing the importance of innovation in advancing technology.