Martin Tilke

Title: Martin Tilke and His Patent in Etching Technology.

Introduction

Martin Tilke is an inventor associated with Jena, Germany, and Jenoptik Optical Systems GmbH. His patent work concerns methods and structures for producing etching masks and patterning substrates.

Latest Patents

The supplied information lists one patent for Martin Tilke: “Method of Producing an Etching Mask, Method of Etching a Structure into a Substrate, Use of a Tetrel Layer and Structure for Producing a Mask.” The patent describes applying a metal layer containing or formed from at least one transition metal and/or aluminum to a substrate, then applying and structuring a masking layer to expose selected processing regions. A tetrel-containing layer is applied to the substrate, forming an interdiffusion zone at the interface between the metal and tetrel layers in those regions. After the masking layer is removed, the metal is selectively etched: the substrate is exposed in etching regions, while at least part of the metal layer remains in the processing regions. The stated patent count is 1 patent.

Career Highlights

Tilke’s listed work connects him with Jenoptik Optical Systems GmbH and focuses on materials and process techniques for etching masks. The patent’s approach uses a tetrel layer and an interdiffusion zone to help control selective etching.

Collaborations

Lutz Raupach is identified as Tilke’s coworker. The supplied information does not specify their particular projects or patent collaborations.

Conclusion

Martin Tilke’s listed patent addresses selective etching-mask production through the interaction of metal and tetrel layers, reflecting his documented work in this area of materials processing.