Buda, TX, United States of America

Martin Garcia

This inventor holds 2 USPTO granted patents. Top assignee: Nxp USA, Inc.. Active years: 2023-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Martin Garcia. Retrieved from https://idiyas.com/inventor/martin-garcia-x2nc79l8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2023-2024

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2 patents (USPTO):Explore Patents

Title: Martin Garcia: Innovator in LDMOS Transistor Technology

Introduction

Martin Garcia is a notable inventor based in Buda, Texas. He has made significant contributions to the field of semiconductor technology, particularly in the development of Laterally Diffused Metal Oxide Semiconductor (LDMOS) transistors. With a total of 2 patents to his name, Garcia continues to push the boundaries of innovation in his field.

Latest Patents

Garcia's latest patents focus on enhancing the performance and manufacturing processes of LDMOS transistors. One of his patents describes an LDMOS transistor with implant alignment spacers. This invention includes a gate stack comprising a first nitride layer formed on a silicon layer, separated from a substrate by a first oxide layer. The gate stack features a polysilicon layer and a second oxide layer on the sidewall of the polysilicon layer. The drain region of the transistor is implanted with a first implant aligned to an edge formed by the second oxide layer. Additionally, a second nitride layer and a nitride etch-stop layer conformingly cover the structure.

Another patent outlines a method for manufacturing an LDMOS transistor with implant alignment spacers. This method involves etching a gate stack, oxidizing it to form a polysilicon layer, and creating a second oxide layer on the sidewall of the polysilicon layer. Similar to the previous patent, the drain region is implanted with a first implant aligned to an edge formed by the second oxide layer, followed by the formation of a second nitride layer and a nitride etch-stop layer.

Career Highlights

Martin Garcia is currently employed at NXP USA, Inc., where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the capabilities of LDMOS transistors, which are widely used in various electronic applications.

Collaborations

Throughout his career, Garcia has collaborated with talented individuals such as Hernan A Rueda and Rodney Arlan Barksdale. These collaborations have contributed to the successful development of innovative technologies in the semiconductor industry.

Conclusion

Martin Garcia is a prominent inventor whose work in LDMOS transistor technology has led to significant advancements in the field. His patents reflect a commitment to innovation and excellence in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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