Montreal, Canada

Martin Drapeau

This inventor holds 3 USPTO granted patents. Top assignee: Synopsys, Inc.. Active years: 2007-2011.


% Patents Active = 100.0

Average Co-Inventor Count = 1.6

ph-index = 2

Forward Citations = 18(Granted Patents)


Location History:

  • Orleans, CA (2007)
  • Ottawa, CA (2010)
  • Montreal, CA (2011)

Company Filing History:


Years Active: 2007-2011

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3 patents (USPTO):Explore Patents

Title: Martin Drapeau: Innovator in Mask Layout Technologies

Introduction

Martin Drapeau is a notable inventor based in Montreal, Canada. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of mask layout technologies. With a total of 3 patents to his name, Drapeau's work has advanced the precision and efficiency of multiple patterning processes.

Latest Patents

Drapeau's latest patents include innovative methods and apparatuses that enhance the determination of mask layouts for multiple patterning processes. One of his key inventions provides a method for determining mask layouts by receiving a design intent and identifying critical edges in the design layout. The system can then create trenches that improve pattern fidelity, which are essential for double patterning processes. Another significant patent focuses on determining whether a sub-resolution assist feature will print. This invention utilizes a process model to assess the printing capability of sub-resolution assist features based on different exposure levels.

Career Highlights

Martin Drapeau has established himself as a leading figure in his field through his work at Synopsys, Inc. His expertise in semiconductor technologies has positioned him as a valuable asset to the company. Drapeau's innovative approaches have contributed to advancements in the manufacturing processes that are critical for modern electronics.

Collaborations

Throughout his career, Drapeau has collaborated with esteemed colleagues such as Lawrence S. Melvin III and Jensheng Huang. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Martin Drapeau's contributions to mask layout technologies have significantly impacted the semiconductor industry. His patents reflect a commitment to enhancing manufacturing processes, ensuring that he remains a key player in the field of innovation.

Profile summary based on public USPTO records.
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