The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 01, 2010

Filed:

Jun. 15, 2006
Applicants:

Lawrence S. Melvin, Iii, Hillsboro, OR (US);

Jensheng Huang, San Jose, CA (US);

Martin Drapeau, Ottawa, CA;

Inventors:

Lawrence S. Melvin, III, Hillsboro, OR (US);

Jensheng Huang, San Jose, CA (US);

Martin Drapeau, Ottawa, CA;

Assignee:

Synopsys, Inc., Mountain View, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

One embodiment of the present invention provides a system that determines whether a sub-resolution assist feature will print. During operation, the system receives a layout which contains a sub-resolution assist feature. Next, the system determines whether the sub-resolution assist feature will print using a process model and the layout. The process model is determined using first process data and second process data. The first process data is obtained using a first layout which is exposed using a first exposure level. The second process data is obtained using a second layout which is exposed using a second exposure level, which is different from the first exposure level. The second exposure level causes the sub-resolution assist features within the second layout to print.


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