Martin Algots

Title: Martin Algots - Innovator in EUV Light Source Technology

Introduction

Martin Algots is a prominent inventor based in San Diego, CA, known for his contributions to the field of extreme ultraviolet (EUV) light source technology. With a focus on innovative methods and apparatuses, Algots has made significant strides in the handling of target materials used in EUV lithography.

Latest Patents

Algots holds a patent for a "Method of and apparatus for supply and recovery of target material." This patent describes an EUV light source target material handling system that includes a droplet generator with a target material reservoir. The system allows for the replenishment of target material while maintaining the nozzle portion of the droplet generator at a specific temperature. Additionally, the patent outlines a mechanism for selectively draining spent target material, enhancing the efficiency of the process.

Career Highlights

Martin Algots is currently employed at ASML Netherlands B.V., a leading company in the semiconductor industry. His work at ASML focuses on advancing technologies that are critical for the production of integrated circuits. Algots' expertise in EUV technology positions him as a key player in the ongoing evolution of semiconductor manufacturing.

Collaborations

Algots collaborates with notable colleagues, including Georgiy Olegovich Vaschenko and Peter Michael Baumgart. Their combined efforts contribute to the innovative projects at ASML, driving forward the development of cutting-edge technologies in the field.

Conclusion

Martin Algots is a significant figure in the realm of EUV light source technology, with a patent that showcases his innovative approach to target material handling. His work at ASML and collaborations with esteemed colleagues further highlight his impact on the semiconductor industry.