The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2017
Filed:
Jan. 09, 2014
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Georgiy Vaschenko, San Diego, CA (US);
Peter Baumgart, San Diego, CA (US);
Jeffrey Gacutan, San Diego, CA (US);
Martin Algots, San Diego, CA (US);
Theodosios Syrpis, San Diego, CA (US);
Chirag Rajyaguru, San Diego, CA (US);
Sanjeev Seshagiri, San Diego, CA (US);
Assignee:
ASML NETHERLANDS, B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G01K 5/00 (2006.01); H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
H05G 2/006 (2013.01); H05G 2/005 (2013.01); H05G 2/008 (2013.01); Y10T 137/6416 (2015.04);
Abstract
An EUV light source target material handling system is disclosed which may comprise a droplet generator having a target material reservoir in which the target material may be replenished while a nozzle portion of the droplet generator is maintained at temperature. Also disclosed is a system for selectively draining spent target material.