Hanover, Germany

Markus Schlosser

This inventor holds 23 USPTO granted patents and 9 published patent applications and 6 EPO patents, primarily in 3D Imaging Technology. Top assignees: Thomson Licensing, Robert Bosch, Thomson Licensing S.a.. Active years: 2012-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Markus Schlosser. Retrieved from https://idiyas.com/inventor/markus-schlosser

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 23 

% Patents Active = 34.8

 

Average Co-Inventor Count = 2.3

ph-index = 4

Forward Citations = 45(Granted Patents)


Location History:

  • Hannover, DE (2012 - 2017)
  • Karlsruhe, DE (2017 - 2022)
  • Jockgrim, DE (2022 - 2023)

Company Filing History:


Years Active: 2012-2023

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Areas of Expertise:
3D Scene Reconstruction
Disparity Estimate
Image Segmentation
FMCW Radar Sensor
Temporal Synchronization
Multi-Camera System
Confidence Maps
Audio Level Meter
Object Detection
Plausibility Checking
23 patents (USPTO):Explore Patents

Title: Markus Schlosser - Innovative Inventor from Hannover

Introduction: Markus Schlosser is a renowned inventor hailing from Hannover, Germany, known for his groundbreaking contributions to various industries.

Latest Patents: Markus Schlosser holds several patents in the fields of renewable energy, sustainable technology, and advanced materials, showcasing his commitment to innovation.

Career Highlights: With a career spanning over two decades, Markus Schlosser has worked with leading research institutions and companies to develop cutting-edge solutions that have revolutionized the way we approach challenges in today's world.

Collaborations: Markus Schlosser has collaborated with top universities and multinational corporations, fostering a culture of innovation and pushing the boundaries of what is possible in the realm of technology.

Conclusion: Markus Schlosser's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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