This inventor holds 2 USPTO granted patents. Top assignees: Infineon Technologies Ag, Qimonda Ag. Active years: 2008-2009.
Company Filing History:
Years Active: 2008-2009
Title: Innovations of Markus Hofsäss
Introduction
Markus Hofsäss is a notable inventor based in Munich, Germany. He has made significant contributions to the field of integrated circuits, holding a total of 2 patents. His work focuses on methods that enhance the reliability and efficiency of semiconductor manufacturing processes.
Latest Patents
One of his latest patents is a method for searching for potential faults in the layout of an integrated circuit. This method involves dividing the layout into sections and allocating predetermined classes to each section based on specific criteria. An evaluation criterion is then applied to determine if a section is potentially faulted. Another significant patent involves a set of masks, including a primary mask and a trimming mask, designed to control diffraction effects during the projection of structure patterns onto a semiconductor wafer. This innovation allows for maximum depth of focus, improving the quality of semiconductor manufacturing.
Career Highlights
Throughout his career, Markus Hofsäss has worked with prominent companies such as Qimonda AG and Infineon Technologies AG. His experience in these organizations has contributed to his expertise in integrated circuit design and manufacturing.
Collaborations
Markus has collaborated with several professionals in his field, including Eva-Maria Nash and Roderick Köhle. These collaborations have further enriched his work and innovations in semiconductor technology.
Conclusion
Markus Hofsäss is a distinguished inventor whose contributions to integrated circuit technology have made a significant impact. His innovative patents and collaborations reflect his commitment to advancing the field of semiconductor manufacturing.