Mierlo, Netherlands

Markus Gerardus Martinus Van Kraaij



Average Co-Inventor Count = 7.7

ph-index = 4

Forward Citations = 130(Granted Patents)


Company Filing History:


Years Active: 2010-2019

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5 patents (USPTO):Explore Patents

Title: The Innovative Journey of Markus Gerardus Martinus Van Kraaij

Introduction: Markus Gerardus Martinus Van Kraaij, an accomplished inventor based in Mierlo, Netherlands, has made significant contributions to the field of lithography characterization. With a total of five patents to his name, his work showcases the intersection of technology and precision in measuring properties of substrates.

Latest Patents: Among his notable inventions is a groundbreaking method and apparatus for angular-resolved spectroscopic lithography characterization. This innovative apparatus determines substrate properties by measuring angle-resolved spectra in the pupil plane of a high numerical aperture lens. The reflected radiation from the substrate can reveal critical information that varies with angle and wavelength, including the intensity of TE- and TM-polarized radiation along with their relative phase differences. This patent underscores Van Kraaij's expertise in enhancing lithographic processes through precise measurements.

Career Highlights: Markus is currently employed at ASML Netherlands B.V., a leading company in the semiconductor industry known for its advanced photolithography systems. His career at ASML has enabled him to work on cutting-edge technologies that push the boundaries of lithographic techniques and applications.

Collaborations: Throughout his career, Markus has collaborated with notable individuals such as Arie Jeffrey Den Boef and Mircea Dusa. Their combined expertise has likely enriched the innovation process, fostering a collaborative environment that drives advancements in their field.

Conclusion: Markus Gerardus Martinus Van Kraaij exemplifies the spirit of innovation in the realm of lithography characterization. His patents demonstrate a commitment to advancing technology and improving the accuracy of substrate measurements. His work at ASML Netherlands B.V. not only reflects his personal achievements but also contributes to the broader landscape of semiconductor technology.

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