The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 07, 2010

Filed:

Jun. 13, 2006
Applicants:

Arie Jeffrey Den Boef, Waalre, NL;

Wilhelmus Maria Corbeij, Eindhoven, NL;

Mircea Dusa, Campbell, CA (US);

Markus Gerardus Martinus Van Kraaij, Mierlo, NL;

Inventors:

Arie Jeffrey Den Boef, Waalre, NL;

Wilhelmus Maria Corbeij, Eindhoven, NL;

Mircea Dusa, Campbell, CA (US);

Markus Gerardus Martinus Van Kraaij, Mierlo, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 4/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The illumination profile of a radiation beam is initially measured using a CCD detector. A reference mirror is then placed in the focal plane of the high aperture lens and the reflected radiation measured. By comparing the illumination profile and the detected radiation it is possible to determine the transmission losses for S and P polarisation which can then be used in scatterometry modeling.


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