Asml Netherlands B.v.

Markus Gerardus Martinus Van Kraaij

Arie Jeffrey Den Boef

Mircea Dusa

Maurits Van Der Schaar

Arno Jan Bleeker

Antoine Gaston Marie Kiers

Henricus Petrus Maria Pellemans

Youri Johannes Laurentius Maria Van Dommelen

Paul Frank Luehrmann

Cedric Desire Grouwstra

Wilhelmus Maria Corbeij

Maurits Van Der Sohaar

An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.

Method and apparatus for angular-resolved spectroscopic lithography characterization

The illumination profile of a radiation beam is initially measured using a CCD detector. A reference mirror is then placed in the focal plane of the high aperture lens and the reflected radiation measured. By comparing the illumination profile and the detected radiation it is possible to determine the transmission losses for S and P polarisation which can then be used in scatterometry modeling.

Characterization of transmission losses in an optical system

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Mierlo, Netherlands

Markus Gerardus Martinus Van Kraaij