Markus Esseling

Title: Innovations by Markus Esseling

Introduction

Markus Esseling is a notable inventor based in Aalen, Germany. He has made significant contributions to the field of particle optics, particularly in methods that enhance the functionality of particle-optical devices. With a total of 2 patents, his work focuses on improving the accuracy and efficiency of imaging techniques.

Latest Patents

One of Markus Esseling's latest patents is titled "Methods and devices for charge compensation." This patent outlines methods for operating a particle-optical device that reduces electrical charging of a sample during examination. The device includes a vacuum chamber for receiving the sample, a particle source for generating a primary particle beam, a scan generator for directing the beam over the sample surface, and at least one detector for capturing interaction products from the sample.

Another significant patent is "Method for avoiding artefacts during serial block face imaging." This method involves capturing a first image of the sample with a primary particle beam at a specific energy level, which allows for the detection of interaction products that predominantly contain information from a layer beneath the sample surface. The method also includes removing the outermost sample layer and capturing a second image to calculate and compensate for any lateral offset of the sample.

Career Highlights

Markus Esseling is currently employed at Carl Zeiss Microscopy GmbH, a company renowned for its advanced optical systems and imaging technologies. His work at this institution has allowed him to develop innovative solutions that address challenges in particle optics.

Collaborations

Throughout his career, Markus has collaborated with esteemed colleagues such as Matthias Langer and Rainer Arnold. These collaborations have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Markus Esseling's contributions to the field of particle optics through his innovative patents demonstrate his commitment to advancing technology in microscopy. His work continues to influence the way samples are examined and understood in scientific research.