Munich, Germany

Markus Cappellaro

This inventor holds 2 USPTO granted patents. Top assignee: Carl Zeiss Microscopy Gmbh. Active years: 2023-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Markus Cappellaro. Retrieved from https://idiyas.com/inventor/markus-cappellaro-yzf224t6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023-2026

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2 patents (USPTO):Explore Patents

Title: Innovations in Particle Analysis by Markus Cappellaro

Introduction

Markus Cappellaro is an accomplished inventor based in Munich, Germany. He has made significant contributions to the field of particle analysis, particularly through his innovative use of light microscopy and multi-pixel polarization filters. His work is essential for determining the technical cleanliness of surfaces in various applications.

Latest Patents

Cappellaro holds a patent for "Particle analysis using light microscope and multi-pixel polarization filter." This patent describes techniques related to the use of a multi-pixel polarization filter in the light-microscopic examination of sample objects. This method allows for effective particle analysis, which is crucial for assessing the cleanliness of surfaces.

Career Highlights

Markus Cappellaro is currently employed at Carl Zeiss Microscopy GmbH, a leading company in the field of microscopy. His role involves developing advanced techniques that enhance the capabilities of light microscopy, thereby improving the accuracy and efficiency of particle analysis.

Collaborations

Cappellaro has collaborated with notable colleagues, including Indrajati Nicole Kastanja and Achim Schwarz. These collaborations have contributed to the advancement of techniques in microscopy and particle analysis.

Conclusion

Markus Cappellaro's innovative work in particle analysis using light microscopy has paved the way for improved methods in assessing surface cleanliness. His contributions are vital to the ongoing advancements in microscopy technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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