Espoo, Finland

Markus Bosund

USPTO Granted Patents = 2 

 

Average Co-Inventor Count = 2.7

ph-index = 1


Company Filing History:


Years Active: 2020-2025

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2 patents (USPTO):Explore Patents

Title: Innovations of Markus Bosund

Introduction

Markus Bosund is a notable inventor based in Espoo, Finland. He has made significant contributions to the field of semiconductor processing and particulate matter treatment. With a total of 2 patents, his work showcases innovative methods and apparatuses that enhance the efficiency and effectiveness of these processes.

Latest Patents

One of his latest patents is titled "Method and apparatus for processing surface of a semiconductor substrate." This invention involves a cluster apparatus that includes a transport chamber and multiple process reactors. The method entails subjecting the substrate surface to a preparation step, creating an interface layer, and applying a functional layer, all while maintaining a vacuum atmosphere during transport between reactors.

Another significant patent is "Apparatus and method for processing particulate matter." This invention focuses on exposing particulate matter to successive surface reactions using gaseous precursors, following atomic layer deposition principles. The apparatus features a vacuum chamber and a reaction chamber equipped with a vibration mechanism to enhance the processing of particulate matter.

Career Highlights

Markus Bosund is currently employed at Beneq Oy, a company known for its advanced technology in thin film deposition and surface treatment. His work at Beneq Oy has allowed him to develop and refine his innovative ideas, contributing to the company's reputation in the industry.

Collaborations

Throughout his career, Markus has collaborated with talented individuals such as Risto Peltonen and Mikko Söderlund. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Markus Bosund's contributions to the field of semiconductor processing and particulate matter treatment highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving processes that are essential in various industries.

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