The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2020
Filed:
Jun. 22, 2017
Beneq Oy, Espoo, FI;
Markus Bosund, Espoo, FI;
Risto Peltonen, Espoo, FI;
BENEQ OY, Espoo, FI;
Abstract
An apparatus and method for processing particulate matter by exposing the particulate matter to successive surface reactions of at least a first and a second gaseous precursor according to the principles of atomic layer deposition. The apparatus includes a vacuum chamber, a reaction chamber for particulate matter, wherein the reaction chamber is provided inside the vacuum chamber, a vibration mechanism for vibrating particulate matter inside the reaction chamber; and a precursor system arranged to supply the at least first and second gaseous precursors through the reaction chamber for subjecting the particulate matter to the at least first and second gaseous precursors. The method includes the steps of supplying the at least first and second gaseous precursors through the reaction chamber for subjecting the particulate matter to the at least first and second gaseous precursors, and vibrating particulate matter inside the reaction chamber.