Richmond, CA, United States of America

Mark William Ellens


Average Co-Inventor Count = 2.0

ph-index = 4

Forward Citations = 42(Granted Patents)


Location History:

  • Vancouver, CA (2003)
  • Richmond, CA (2010 - 2013)

Company Filing History:


Years Active: 2003-2013

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5 patents (USPTO):Explore Patents

Title: Mark William Ellens: Innovator in Photoelastic Technology

Introduction

Mark William Ellens is a notable inventor based in Richmond, CA (US). He has made significant contributions to the field of photoelastic technology, holding a total of 5 patents. His work focuses on innovative methods for detecting stress and strain in structural components, which has important applications in various industries.

Latest Patents

One of his latest patents is for a photoelastic layer with an integrated polarizer. This invention allows for the detection of stresses and strains using non-polarized incident light, which reduces both inspection costs and time associated with photoelastic analysis. Another significant patent is a monitoring device designed for detecting stress and strain in structural components. This device includes a detection zone and is engineered to correlate the stress and strain experienced by the structure with the measurements taken at the monitoring device.

Career Highlights

Throughout his career, Mark has worked with various companies, including Teleflex Canada Incorporated. His innovative contributions have advanced the understanding and application of photoelastic methods in engineering and materials science.

Collaborations

Mark has collaborated with notable professionals in his field, including Duhane Lam and Davor Baros. Their combined expertise has furthered the development of effective monitoring devices for structural integrity.

Conclusion

Mark William Ellens is a distinguished inventor whose work in photoelastic technology has paved the way for advancements in stress and strain detection. His patents reflect a commitment to innovation and practical solutions in engineering.

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