Mark M Stark

Title: The Innovations of Mark M Stark

Introduction

Mark M Stark is a notable inventor based in Kamakura, Japan. He has made significant contributions to the field of plasma etching technology, holding two patents that showcase his innovative approach to improving etching processes.

Latest Patents

One of Stark's latest patents is for a "Xenon Enhanced Plasma Etch." This invention discloses a plasma etch process and apparatus that utilizes a gas mixture comprising CF.sub.3 Br, xenon or krypton, and oxygen. The design includes a sacrificial element, preferably in the form of a graphite ring, located on the lower electrode of a parallel plate reactor. Another significant patent is for a "Non-Uniform Gas Inlet for Dry Etching Apparatus." This invention features a gas inlet with a non-uniform array of inlet holes, allowing for the non-uniform introduction of an etching gas into a reaction chamber. This innovative approach compensates for non-uniform characteristics in the dry etching apparatus, resulting in a more uniform etch.

Career Highlights

Mark M Stark is currently associated with Tegal Corporation, where he continues to develop cutting-edge technologies in the field of plasma etching. His work has been instrumental in advancing the capabilities of dry etching processes, making them more efficient and effective.

Collaborations

Stark has collaborated with several talented individuals in his field, including Douglas H Warenback and David J Drage. These collaborations have contributed to the successful development of his innovative patents.

Conclusion

Mark M Stark's contributions to plasma etching technology highlight his role as a leading inventor in the industry. His innovative patents reflect his commitment to advancing technology and improving etching processes.