The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 1988
Filed:
May. 11, 1987
Applicant:
Inventors:
Mark M Stark, Kamakura, JP;
Douglas H Warenback, San Rafael, CA (US);
David J Drage, Sebastopol, CA (US);
Assignee:
Tegal Corporation, Petaluma, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23F / ;
U.S. Cl.
CPC ...
156345 ; 204298 ;
Abstract
A gas inlet having a non-uniform array of inlet holes for the non-uniform introduction of an etching gas into a reaction chamber of a dry etching apparatus. The non-uniform introduction of gas compensates for non-uniform characteristics in the dry etching apparatus resulting in a uniform etch.
Published as: