Mountain View, CA, United States of America

Mark Hyun Lee


 

Average Co-Inventor Count = 5.7

ph-index = 2

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 2018-2025

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5 patents (USPTO):

Title: The Innovative Contributions of Mark Hyun Lee

Introduction

Mark Hyun Lee, located in Mountain View, California, is an accomplished inventor known for his work in the field of materials science and engineering. With five patents to his name, Lee has made significant contributions in reducing contact resistance in cobalt-titanium structures, an area vital for various electronic applications.

Latest Patents

Lee's latest patents focus on methods for controlling contact resistance in cobalt-titanium structures. One of the methods involves the deposition of a titanium layer using a chemical vapor deposition (CVD) process, followed by a first cobalt layer on the titanium nitride base through a physical vapor deposition (PVD) process. A second cobalt layer is then deposited on the first cobalt layer via a CVD process. Another of his patents details a similar method but includes the deposition of a titanium nitride layer using an atomic layer deposition (ALD) process between the titanium and cobalt layers. These innovative techniques showcase Lee's commitment to advancing material fabrication processes, essential for improving device performance.

Career Highlights

Mark Hyun Lee is currently associated with Applied Materials, Inc., a leader in providing equipment, services, and software for the manufacture of semiconductor chips. His work within the company emphasizes novel approaches to material engineering, allowing for more efficient and effective production methods in the semiconductor sector.

Collaborations

Throughout his career, Lee has collaborated with notable colleagues such as Avgerinos V Gelatos and Takashi Kuratomi. Together, they have driven forward the research and development efforts in their field, fostering an environment of innovation and creativity that benefits both the company and the broader industry.

Conclusion

Through his inventive spirit and dedication to material science, Mark Hyun Lee exemplifies the impact of innovation in technology. His advancements in reducing contact resistance not only enhance the capabilities of cobalt-titanium structures but also pave the way for future discoveries in the realm of electronic materials. Lee's contributions serve as an inspiration to aspiring inventors in the field, highlighting the importance of research and collaboration in driving technological advancement.

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