Dorchester, MA, United States of America

Mark Howard

This inventor holds 1 USPTO granted patent. Top assignee: Onto Innovation Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mark Howard. Retrieved from https://idiyas.com/inventor/mark-howard-aquzp4lv

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Mark Howard - Innovator in Substrate Edge Patterning Techniques

Introduction

Mark Howard is a notable inventor based in Dorchester, MA (US). He has made significant contributions to the field of substrate edge patterning techniques. His innovative work has led to the development of a patent that enhances the efficiency of imaging edge regions of substrate panels.

Latest Patents

Mark Howard holds a patent for "Substrate edge patterning techniques." This patent describes various techniques to quickly image one or more edge regions of a substrate panel without affecting other regions. The methods include the use of an illumination mask assembly coupled to a clamp assembly, which allows for precise imaging of edge regions, including dummy patterns. This innovation is particularly useful when preparing substrate panels for immersion in plating baths.

Career Highlights

Mark Howard is currently employed at Onto Innovation Inc., where he continues to advance his research and development efforts. His work has been instrumental in improving substrate processing techniques, which are critical in various manufacturing applications.

Collaborations

Mark has collaborated with notable colleagues, including Keith F Best and Douglas A Brown. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Mark Howard's contributions to substrate edge patterning techniques exemplify the impact of innovative thinking in technology. His patent and ongoing work at Onto Innovation Inc. highlight the importance of advancements in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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