San Jose, CA, United States of America

Mark Borowicz

USPTO Granted Patents = 4 

Average Co-Inventor Count = 3.6

ph-index = 3

Forward Citations = 55(Granted Patents)


Company Filing History:


Years Active: 2007-2014

Loading Chart...
4 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Mark Borowicz

Introduction

Mark Borowicz is a notable inventor based in San Jose, California. He has made significant contributions to the field of substrate analysis and electron beam imaging. With a total of four patents to his name, Borowicz continues to push the boundaries of technology and innovation.

Latest Patents

Borowicz's latest patents include methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis. One method involves removing a portion of a feature on the substrate using an electron beam to expose a cross-sectional profile of the remaining portion. This feature may be a photoresist feature, and the method also includes measuring a characteristic of the cross-sectional profile. Another method for preparing a substrate for analysis involves removing a portion of a material on the substrate near a defect using chemical etching combined with an electron beam. This defect may be a subsurface defect or a partially subsurface defect. Additionally, he has developed a charge-control method and apparatus for electron beam imaging, which includes scanning an electron beam over a target area of a substrate and detecting extracted secondary electrons.

Career Highlights

Mark Borowicz is currently employed at KLA-Tencor Technologies Corporation, where he applies his expertise in substrate analysis and imaging technologies. His work has been instrumental in advancing the capabilities of electron beam imaging and substrate preparation.

Collaborations

Throughout his career, Borowicz has collaborated with talented individuals such as Rudy Flores Garcia and Tzu Chin Chuang. These collaborations have contributed to the development of innovative solutions in the field.

Conclusion

Mark Borowicz's contributions to the field of substrate analysis and electron beam imaging highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving methods and systems that are crucial in various applications.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…