Mark A Burgholzer

Title: The Innovations of Mark A. Burgholzer in Semiconductor Technology

Introduction

Mark A. Burgholzer is an accomplished inventor based in Amboy, Washington. With a focus on semiconductor fabrication, he has made significant contributions to the field, particularly in the area of selective etching processes. His innovative work has resulted in one patent, showcasing his dedication and expertise in advancing technology.

Latest Patents

Mark A. Burgholzer holds a patent for a selective etching process of silicon nitride and indium oxide thin films aimed at ferroelectric RAM (FeRAM) device applications. His patent describes a dry etch process that effectively selectively etches silicon nitride from conductive oxide materials. The incorporation of an oxidant in the etch gas mixture can enhance the etch rate of silicon nitride while simultaneously reducing the etch rate for the conductive oxide, thereby improving the overall etch selectivity. This selective etch process is particularly well-suited for the fabrication of ferroelectric memory devices, using a conductive oxide/ferroelectric interface where silicon nitride acts as an encapsulated material for the ferroelectric.

Career Highlights

Mark has established his career at Sharp Laboratories of America, Inc., where he has been able to apply his skills and knowledge to cutting-edge research and development in semiconductor technology. His innovative approach to etching processes has positioned him as a valuable contributor in the field.

Collaborations

Throughout his career, Mark A. Burgholzer has worked alongside notable colleagues, including Tingkai Li and Sheng Teng Hsu. These collaborations have fostered an environment of creativity and idea-sharing, further enhancing the advancements made in semiconductor fabrication techniques.

Conclusion

Mark A. Burgholzer's contribution to the field of semiconductor technology through his patent on selective etching processes exemplifies the essence of innovation. His work not only advances the understanding of etching processes in device fabrication but also highlights the importance of collaboration and expertise in driving technological progress.