Marinus J M De Blank

Title: Marinus J M De Blank: Innovator in Silicon Dioxide Manufacturing

Introduction

Marinus J M De Blank is a noteworthy inventor based in Heverlee, Belgium, recognized for his contributions to the field of materials science. He holds a significant patent related to the manufacturing of a silicon dioxide layer, which has applications in various technological sectors.

Latest Patents

De Blank's patent titled "Method of manufacturing a silicon dioxide layer" involves a novel approach to create a layer of silicon dioxide with low roughness. The process includes depositing a silicon dioxide layer over a substrate using a low-pressure chemical vapor deposition (LPCVD) method. This involves simultaneous flows of tetraethylorthosilicate (TEOS) as the source material and a non-reactive diluant gas. The unique ratio of diluant gas to TEOS can range from 0.5 to 100, and the silicon dioxide layer is subsequently annealed at a temperature between 600° C. and 1200° C. for a duration ranging from 10 minutes to 6 hours.

Career Highlights

Throughout his career, Marinus J M De Blank has made significant strides in the field of semiconductor technologies. He has worked with esteemed companies such as S.O.I.TEC Silicon on Insulator Technologies and ASM International N.V., where he applied his expertise in the development and manufacturing of advanced materials.

Collaborations

De Blank's journey has allowed him to collaborate with talented professionals in the industry, including Konstantin Bourdelle and Nicolas Daval. These collaborations have likely contributed to the innovation and enhancement of his patented technologies and processes.

Conclusion

Marinus J M De Blank stands out as a remarkable inventor contributing to the advancement of silicon dioxide manufacturing techniques. With his patented method, he has paved the way for improved processes in technology and materials science, showcasing the importance of innovation in driving progress across various industries.