Mariko Kimura

Title: Mariko Kimura: Innovator in Polycrystalline Thin Film Technologies

Introduction

Mariko Kimura is a distinguished inventor based in Tokyo, Japan, recognized for her groundbreaking work in the field of materials science. With a total of four patents, her contributions significantly advance the development of thin film technologies.

Latest Patents

One of her prominent inventions is a novel method of producing a polycrystalline thin film of magnesium oxide (MgO). This method employs an ion sputtering process that involves irradiating a target with an ion beam to dislodge particles, which are then deposited onto a substrate. The process is optimized for reduced pressure atmospheres, specifically targeting pressure levels of 3.0×10 Pa or lower while maintaining the substrate temperature at or below 300°C. Additionally, Mariko's patented innovation regarding the formation of polycrystalline thin films consists mainly of oxide crystal grains with a Type C rare earth oxide crystal structure. This method also focuses on controlling grain boundary inclination angles within 30 degrees along the plane parallel to the film-forming surface.

Career Highlights

Throughout her career, Mariko has made significant contributions while working with notable companies, including Kabushiki Kaisha Toshiba. Her research and developments have led to advancements in the field that are applicable in various high-tech sectors.

Collaborations

Mariko has collaborated with other well-known innovators, such as Yasuhiro Iijima and Takashi Saito. These collaborations have enriched her projects, fostering a creative environment for innovation in thin-film technologies.

Conclusion

Mariko Kimura's contributions to the field of materials science represent significant milestones in the development of polycrystalline thin films. Her innovative techniques and collaborative efforts continue to inspire a new generation of inventors in Tokyo and beyond.