Uden, Netherlands

Marcus J H Willems Van Dijk

This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Marcus J H Willems Van Dijk. Retrieved from https://idiyas.com/inventor/marcus-j-h-willems-van-dijk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: Marcus J H Willems van Dijk: A Pioneer in Inventions and Patents

Introduction:

Marcus J H Willems van Dijk, a distinguished inventor from Uden, Netherlands, stands as a beacon of inspiration in the world of inventions and patents. With a relentless pursuit of innovation, he continues to shape the future of technology and industry, establishing himself as a true pioneer in his field.

Latest Patents:

One of Marcus J H Willems van Dijk's notable patents is the "Object positioning method for a lithographic projection apparatus," which revolutionizes the placement of objects such as substrates or masks on a table in the field of lithography.

Career Highlights:

Marcus J H Willems van Dijk is associated with ASML Netherlands B.V., a prominent company in the tech industry known for its advancements in lithography and semiconductor manufacturing. His innovative contributions have propelled the company's success and reputation in the field.

Collaborations:

Throughout his career, Marcus J H Willems van Dijk has collaborated with esteemed colleagues such as Engelbertus A F van de Pasch and Thomas J M Castenmiller. Together, they have worked on groundbreaking projects that have pushed the boundaries of technological innovation.

Conclusion:

In conclusion, Marcus J H Willems van Dijk's dedication to innovation and his remarkable contributions to the field of patents and inventions have solidified his place as a pioneer in the industry. His work continues to inspire future generations of inventors and shape the trajectory of technology worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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