Location History:
- Tucson, AZ (US) (2001 - 2003)
- Templeton, CA (US) (2006)
Company Filing History:
Years Active: 2001-2006
Title: The Innovations of Marc De Leeuwe: A Pioneer in Semiconductor Cleaning Technologies
Introduction
Marc De Leeuwe, based in Templeton, CA, is an accomplished inventor with a total of three patents to his name. His work primarily focuses on enhancing cleaning processes in the semiconductor industry, showcasing his expertise and innovative spirit in this critical field.
Latest Patents
Among Marc's latest patents are significant advancements in the removal of chemical mechanical polishing (CMP) residues from semiconductors. His first patent, titled "Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process," outlines a method where an object is placed in a pressurized chamber, followed by a supercritical carbon dioxide process to effectively eliminate CMP residue from the surface. His second patent, "Removal of CMP residue from semiconductor substrate using supercritical carbon dioxide process," details another systematic approach where a semiconductor substrate with residual CMP is treated in a pressure chamber with supercritical carbon dioxide and a solvent, ensuring thorough cleaning by maintaining contact until the residues are removed.
Career Highlights
Marc De Leeuwe has made significant contributions to the semiconductor industry during his career. He has worked with renowned companies such as Tokyo Electron Limited and Supercritical Systems, Inc., where his skills in innovative cleaning processes have been critical to advancements in semiconductor manufacturing technologies.
Collaborations
Throughout his career, Marc has collaborated with talented individuals in the field, including William H. Mullee and Glenn A. Roberson, Jr. These collaborations have helped propel the development and implementation of effective semiconductor cleaning solutions, showcasing the power of teamwork in driving technological innovations.
Conclusion
Marc De Leeuwe continues to be a prominent figure in semiconductor technology with his inventive solutions aimed at improving cleaning processes. His patents not only reflect his innovative capabilities but also contribute to the ongoing evolution of the semiconductor industry, further enhancing the efficiency and effectiveness of manufacturing practices.