Company Filing History:
1 out of 8,693 
1 out of 3,785 
Years Active: 2020-2025
Title: Innovations of Mansa Rajagopalan in Plasma Processing and Metallic Materials
Introduction
Mansa Rajagopalan is an inventive mind based in San Ramon, California, known for his contributions to advanced materials and plasma processing technologies. With two patents to his name, his work reflects a deep understanding of material science and engineering.
Latest Patents
1. **Macroscopic Texturing for Anodized and Coated Surfaces**
This patent presents a consumable part intended for a plasma processing chamber. It features a plasma facing side with an engineered surface comprising a plurality of raised features organized in a predefined pattern. Each raised feature is designed to have a rounded top region and an angled sidewall, with a base surface enveloping the features to optimize exposure to plasma and its byproducts during processing.
2. **Extreme Creep Resistant Nano-Crystalline Metallic Materials**
In this innovation, Rajagopalan introduces a remarkable nano-crystalline metallic material characterized by a matrix of solvent metal with finely-sized crystalline grains. These grains are complemented by dispersed metallic particles, strategically placed to enhance the material's resistance to creep at elevated temperatures, effectively blocking grain boundary motion.
Career Highlights
Mansa has collaborated with esteemed organizations such as the US Government, represented by the Secretary of the Army, and Lam Research Corporation. His roles in these organizations have enabled him to contribute significantly to research and development in the field of materials engineering.
Collaborations
Throughout his career, Rajagopalan has worked alongside notable coworkers, including Laszlo John Kecskes and Kristopher Allen Darling. Their collective expertise has likely fostered an environment of innovation and teamwork in the projects they undertook.
Conclusion
Mansa Rajagopalan’s patents exemplify his innovative spirit and dedication to advancing technology in material sciences and plasma processing. His work not only enhances current methodologies but also sets the groundwork for future developments in the field.