Saga, Japan

Manabu Nishimoto

USPTO Granted Patents = 7 

 

Average Co-Inventor Count = 4.7

ph-index = 4

Forward Citations = 82(Granted Patents)


Location History:

  • Amagasaki, JP (1992 - 2002)
  • Saga-ken, JP (2003)
  • Osaka, JP (2003)
  • Saga, JP (2004)
  • Tokyo, JP (2004 - 2013)

Company Filing History:


Years Active: 1992-2013

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7 patents (USPTO):Explore Patents

Title: Innovative Contributions of Manabu Nishimoto in Silicon Technology

Introduction

Manabu Nishimoto, a prominent inventor based in Saga, Japan, has made significant strides in the field of silicon technology. With a total of seven patents to his name, he has played a pivotal role in advancing methods for producing high-quality silicon wafers, essential components in the electronics industry.

Latest Patents

Among his notable innovations are two recent patents that highlight his expertise in silicon wafer production. The first patent focuses on a method for producing a silicon wafer, involving the formation of a silicon ingot through a Czochralski (CZ) method. This process maintains an interstitial oxygen concentration of not more than 7.0×10 atoms per cm and emphasizes precise doping with phosphorus. It further incorporates the formation of a polysilicon layer or strained layer on one surface of the wafer, complemented by a mirror-polished finish on the opposite surface.

Nishimoto's second patent addresses a novel crystal growth method in the CZ process, which employs a specially designed cooling member. This innovation not only enhances the pulling speed but also mitigates the emergence of cracks in single crystals due to excessive cooling. By regulating the temperature of the cooling member to be below 500°C, he ensures high-quality crystal formation, while the dimensions of the cooling member are optimized for efficiency.

Career Highlights

Throughout his career, Manabu Nishimoto has worked with renowned companies, including Sumitomo Metal Industries, Inc. and Sumitomo Mitsubishi Silicon Corporation. His tenure at these organizations allowed him to hone his skills and contribute to cutting-edge developments in silicon technology.

Collaborations

Nishimoto has collaborated with talented individuals in the field, including Takayuki Kubo and Masahiko Okui. These partnerships have likely enriched his innovative processes and contributed to the successful development of his patented technologies.

Conclusion

Manabu Nishimoto's contributions to silicon wafer production and crystal growth methodologies exemplify the spirit of innovation in technology. His patents serve as significant advancements in the electronics industry, enabling the production of high-quality wafers essential for modern electronic devices. With his continued dedication to research and development, he is sure to inspire future generations of inventors and engineers.

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