This inventor holds 2 USPTO granted patents. Top assignee: Canon Kabushiki Kaisha. Active years: 1998-2002.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1998-2002
Title: Manabu Matsuo: Innovator in Plasma Processing Technology
Introduction
Manabu Matsuo is a distinguished inventor based in Chiba, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 2 patents. His work focuses on innovative apparatuses that enhance the efficiency and effectiveness of plasma processing.
Latest Patents
Matsuo's latest patents include a "Plasma processing apparatus provided with microwave applicator having annular waveguide and processing method." This invention features a container that can be evacuated, a gas supply means for introducing gas into the container, and a microwave supply means that generates plasma for processing articles. The microwave applicator is designed with an annular waveguide that has a planar H-plane with multiple slots, allowing for efficient microwave distribution.
Another notable patent is the "Substrate rotating device," which consists of a horizontally placed turntable and a substrate supporting member. This device regulates the vertical position of the substrate while allowing for rotation through a driving mechanism. It also includes an evacuating mechanism that works in conjunction with the turntable to maintain optimal conditions during processing.
Career Highlights
Matsuo is currently employed at Canon Kabushiki Kaisha, a leading company in imaging and printing technologies. His role involves developing advanced technologies that push the boundaries of plasma processing applications. His innovative spirit and technical expertise have made him a valuable asset to the company.
Collaborations
Matsuo has collaborated with notable colleagues such as Hirohisa Oda and Nobumasa Suzuki. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies in the field.
Conclusion
Manabu Matsuo's contributions to plasma processing technology exemplify his dedication to innovation and excellence. His patents reflect a commitment to advancing the capabilities of plasma processing, making a significant impact in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
